Imagine indisponibilăETK Cell Based ELISA Kit
Pe scurt
ETK Cell Based ELISA Kit este un kit ELISA de tip Cell-based (qualitative) pentru măsurarea BMX, cu reactivitate declarată pentru Human, Mouse. Măsoară în domeniul > 5000 Cells, folosește detecție Colorimetric și se poate folosi pe probe de tip Adherent and suspension cells. Se livrează în mărimea 96T, la prețul de 3.826,63 lei cu TVA.
Produse destinate exclusiv cercetării. Nu se utilizează în diagnostic sau tratament.
Descriere
ETK Cell Based ELISA Kit is a Enzyme-Linked Immunosorbent Assay designed for the indirect in vitro quantitative determination of BMX levels in adherent and suspension cells.
Specificații
- Brand
- Antibodies
- Mărime
- 96T
- Țintă
- BMX
- Applications
- Cell-Based ELISA
- Reactivity
- Human, Mouse
- Assay type
- Cell-based (qualitative)
- Sample type
- Adherent and suspension cells.
- Cross reactivity
- No reported cross-reactivity.
- Detection type
- Colorimetric
- Product range
- > 5000 Cells
- Assay Time
- 4 hours 30 minutes
- Principiul testului
- This ETK Cell-Based ELISA Kit allows for the detection of ETK and the effects that certain stimulation conditions have on ETK expression in different cell lines. Qualitative determination of ETK concentration is achieved by an indirect ELISA format. In essence, the ETK is captured by Anti-ETK Antibodies which in turn are detected by HRP-conjugated secondary antibodies. Through this binding, the HRP enzyme (conjugated to the secondary antibody) can catalyze a colorimetric reaction upon substrate addition. Due to the qualitative nature of this ETK Cell-Based ELISA Kit, multiple normalization methods are described: 1) Anti-GAPDH Antibody is included to serve as an internal positive control in normalizing the target absorbance values. 2) Following the colorimetric measurement of HRP activity via substrate addition, the Crystal Violet whole-cell staining method is used to determine cell density. After staining, the results can be analyzed by normalizing the absorbance values to cell amounts, by which the plating difference can be adjusted.
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